The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2007
Filed:
Jul. 08, 2005
Dean Hunt, Danville, CA (US);
Costas J. Spanos, Lafayette, CA (US);
Michael Welch, Livermore, CA (US);
Kameshwar Poolla, Berkeley, CA (US);
Mason L. Freed, Pleasant Hill, CA (US);
Dean Hunt, Danville, CA (US);
Costas J. Spanos, Lafayette, CA (US);
Michael Welch, Livermore, CA (US);
Kameshwar Poolla, Berkeley, CA (US);
Mason L. Freed, Pleasant Hill, CA (US);
OnWafer Technologies, Inc., Santa Clara, CA (US);
Abstract
This invention seeks to provide methods and apparatus that can improve the accuracy of measured parameter data used for processing workpieces. One aspect of the present invention includes methods of measuring process conditions with low distortion of the measurements caused by the measuring apparatus. The measurements include data for applications such as data for monitoring, controlling, and optimizing processes and process tools. Another aspect of the present invention includes apparatus for measuring substantially correct data for applications such as generating data for monitoring, controlling, and optimizing processes and process tools.