The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 20, 2007

Filed:

Dec. 08, 2005
Applicants:

Zeev Iluz, Gan-Yavne, IL;

Reuven Bauer, Rehovot, IL;

Inventors:

Zeev Iluz, Gan-Yavne, IL;

Reuven Bauer, Rehovot, IL;

Assignee:

Elta Systems Ltd., Ashdod, IL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 1/38 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of suppressing grating lobes generated in a radiating pattern of a phased array antenna, and a patch antenna element for use in the phased array antenna are described. The phased array antenna is formed from a plurality of symmetrical patch antenna elements spaced apart at a predetermined distance from each other. Each patch antenna element is configured for producing an asymmetrical radiation pattern. The antenna element includes a conductive ground plane, a radiating patch backed by a cavity and arranged in cavity aperture, and a feed arrangement. The patch antenna element is configured such that a dimension of the radiating patch along the E-plane of the antenna element is less than the dimension of the cavity aperture by a first predetermined value selected to provide an asymmetrical radiation pattern of the patch antenna element. To provide a required degree of the asymmetry of said radiation pattern, a dimension of the radiating patch along the H-plane should be less than the dimension of the cavity aperture along said H-plane by a second predetermined value.


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