The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2007
Filed:
Jul. 07, 2005
Applicants:
Lisa V. Rozario, San Jose, CA (US);
Andy Strachan, Santa Clara, CA (US);
Inventors:
Lisa V. Rozario, San Jose, CA (US);
Andy Strachan, Santa Clara, CA (US);
Assignee:
National Semiconductor Corporation, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 31/26 (2006.01); G01R 31/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The trench leakage current of a deep trench isolation structure is measured. The deep trench isolation structure, which is filled with polysilicon, contacts both a first region of a first conductivity type and a second region of a second conductivity type, and is proximate to a third region of the first conductivity type formed in the second region. Test voltages are applied to the structures and the leakage current is measured.