The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2007
Filed:
Nov. 08, 2005
Applicants:
Yoshi Ono, Camas, WA (US);
Bruce D. Ulrich, Beaverton, OR (US);
Inventors:
Yoshi Ono, Camas, WA (US);
Bruce D. Ulrich, Beaverton, OR (US);
Assignee:
Sharp Laboratories of America, Inc., Camas, WA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of forming a microlens array includes preparing a substrate; fabricating a photosensitive array on the substrate; depositing a layer of lens material on the photosensitive array; depositing and patterning photoresist on the lens material, wherein patterning includes forming a photoresist region having a solid curved upper surface and a substantially rectangular base on the lens material layer; developing the photoresist; reflowing the photoresist; and processing the lens material for form a microlens array.