The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2007
Filed:
Jun. 02, 2005
Deog-bae Kim, Kyungki-Do, KR;
Sang-jeoung Kim, Kyungki-Do, KR;
Hwa-young Kim, Kyungki-Do, KR;
Jin Jegal, Kyungki-Do, KR;
Jae-hyun Kim, Kyungki-Do, KR;
Deog-Bae Kim, Kyungki-Do, KR;
Sang-Jeoung Kim, Kyungki-Do, KR;
Hwa-Young Kim, Kyungki-Do, KR;
Jin Jegal, Kyungki-Do, KR;
Jae-Hyun Kim, Kyungki-Do, KR;
Dongjin Semichem Co., Ltd., Incheon, KR;
Abstract
A photosensitive polymer for forming high-resolution fine circuit patterns with an exposure light source of a short wavelength, and a chemically amplified photoresist composition including the polymer, are disclosed. The photosensitive polymer is represented by the following Formula 1, wherein Ris a hydrogen atom, Ris a hydrogen atom, Ris a chlorine atom, a bromine atom, hydroxy, cyano, t-butoxy, CHNH, CONH, CH═NH, CH(OH)NHor C(OH)═NH group, Ris a hydrogen atom or methyl group, each of 1-x-y-z, x, y and z is a degree of polymerization of each repeating unit constituting the photosensitive polymer, x, y and z are 0.01 to 0.8, respectively, and n is 1 or 2.