The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2007
Filed:
Dec. 19, 2003
Charles Fredrick Brucker, Pleasanton, CA (US);
Jean Ling Lee, San Jose, CA (US);
Charles Fredrick Brucker, Pleasanton, CA (US);
Jean Ling Lee, San Jose, CA (US);
Seagate Technology LLC, Scotts Valley, CA (US);
Abstract
Generally, methods and apparatus are disclosed for fabrication of angle-of-incidence layers on a substrate. In one embodiment, the angle-of-incidence layers may have either radial or circumferential tilt symmetry, using, for example, sputtering or evaporation techniques. In one example, an apparatus for sputtering material comprises a substrate support member, a cathode positioned in substantially facing relationship with respect to the substrate support member and a shutter plate. The shutter plate is disposed between the substrate support member and the cathode and defining an aperture for selective transmission of sputtered articles from the cathode on the basis of a non-perpendicular trajectory angle relative to a plane of the substrate support member.