The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2007
Filed:
Feb. 20, 2003
Toshiyuki Suzuki, Shinjuku-Ku, JP;
Arimichi Ito, Shinjuku-Ku, JP;
Nobuhito Toyama, Shinjuku-Ku, JP;
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Abstract
An antireflection structure () comprises a base (), and a finely roughened antireflection part () formed in a surface of the base (). The finely roughened antireflection part () includes a plurality of projections and depressions defined by the projections. The projections are distributed such that P≦λ, where Pis the biggest one of distances between tips () of the adjacent projections and λis the shortest one of wavelengths of visible light rays in a vacuum. The sectional area of each projection in a plane parallel to the surface of the base () increases continuously from the tip () toward the bottom () of the depression adjacent to the projection. The shape () of a tip part (Mt) of each projection in a plane perpendicular to the surface of the base () is sharper than the shape () of a bottom part (Mb) of each depression in the same plane vertical to the surface of the base ().