The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2007
Filed:
Sep. 13, 2002
Applicant:
Isao Matsui, Saitama, JP;
Inventor:
Isao Matsui, Saitama, JP;
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C01F 17/00 (2006.01); C01G 23/047 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of manufacturing fine particles of the invention includes introducing a reactive gas flow containing a fine particle source material into a reactor from one side, growing fine particles in a gas phase by heating the fine particle source material in the reactive gas flow, introducing a diluting gas flow into the reactor from another side being almost counter-flow to the reactive gas flow, equalizing flow rates of the reactive gas flow and the diluting gas flow substantially with respect to a cross section of a flow channel, and then stopping growth of the fine particles by merging the reactive gas flow and the diluting gas flow.