The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2007
Filed:
Nov. 22, 2005
Ramkumar Kashyap Oruganti, Karnataka, IN;
Pazhayannur Ramanathan Subramanian, Niskayuna, NY (US);
Judson Sloan Marte, Wynantskill, NY (US);
Ramkumar Kashyap Oruganti, Karnataka, IN;
Pazhayannur Ramanathan Subramanian, Niskayuna, NY (US);
Judson Sloan Marte, Wynantskill, NY (US);
General Electric Company, Niskayuna, NY (US);
Abstract
A method of making nano/sub-micron sized grains in a work piece material having a lateral side has the steps of providing a die. The die has an entrance channel with a longitudinal axis and an exit channel. The entrance channel and the exit channel are connected to one another to form an angle. The method has the step of providing a first sacrificial material with a complementary size to the work piece and placing the sacrificial first material and the work piece in an entrance channel. The first sacrificial material and the work piece are aligned with the longitudinal axis. The method has the step of extruding the combination of the first sacrificial material, and the work piece through the intersection of the entrance and the exit channels. The resulting shear deformation forms the nano/sub-micron sized grains in the work piece. This configuration reduces frictional effects thereby producing homogenous nano grain structure. This configuration reduces applied load and enables equal channel angular extrusion of thin sheets.