The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2007
Filed:
Sep. 08, 2004
Danning Yang, Fremont, CA (US);
Yingjian Chen, Fremont, CA (US);
Brant Nease, Fremont, CA (US);
Kyusik Sin, Pleasanton, CA (US);
Danning Yang, Fremont, CA (US);
Yingjian Chen, Fremont, CA (US);
Brant Nease, Fremont, CA (US);
Kyusik Sin, Pleasanton, CA (US);
Western Digital (Fremont), LLC, Fremont, CA (US);
Abstract
A method and system for manufacturing a perpendicular magnetic recording head is disclosed. The method and system include providing a chemical mechanical planarization (CMP) uniformity structure having an aperture therein and forming a perpendicular magnetic recording pole within the aperture. The CMP uniformity structure may include a CMP barrier layer. The method and system further include fabricating an insulator after formation of the perpendicular magnetic recording pole and performing a CMP to remove a portion of the insulator, expose a portion of the perpendicular magnetic recording pole and planarize an exposed surface of the perpendicular magnetic recording head.