The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2007
Filed:
Jan. 31, 2002
Brian King, Longmont, CO (US);
Brian King, Longmont, CO (US);
InPhase Technologies, Inc., Longmont, CO (US);
Abstract
An apodization system for achieving a substantially uniform intensity profile of a modulated reference beam on a holographic recording medium. The substantially uniform intensity profile serves to improve the quality of any and all recorded holograms. In high-density holographic storage, the apodization system reduces the required hologram extent while still, maintaining any fidelity constraints (power budget, imaging tolerances, error-rate, noise floor). Furthermore, in high-fidelity holographic storage, better control of the hologram recording parameters can be established. The improved control allows tighter specifications on the image quality to be achieved.