The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2007
Filed:
Dec. 01, 2004
Ramkumar Subramanian, Sunnyvale, CA (US);
Bhanwar Singh, Morgan Hill, CA (US);
Khoi A. Phan, San Jose, CA (US);
Ramkumar Subramanian, Sunnyvale, CA (US);
Bhanwar Singh, Morgan Hill, CA (US);
Khoi A. Phan, San Jose, CA (US);
Advanced Micro Devices, Inc., Austin, TX (US);
Abstract
Systems and methodologies are provided that account for surface variations of a wafer by adjusting grating features of an imprint lithography mask. Such adjustment employs piezoelectric elements as part of the mask, which can change dimensions (e.g., a height change) and/or move when subjected to an electric voltage. Accordingly, by regulating the amount of electric voltage applied to the piezoelectric elements a controlled expansion for such elements can be obtained, to accommodate for topography variations of the wafer surface.