The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2007
Filed:
Jun. 01, 2005
Hitoshi Kuninaka, Sagamihara, JP;
Hitoshi Kuninaka, Sagamihara, JP;
Japan Aerospace Exploration Agency, Tokyo, JP;
Abstract
Disclosed is a high-frequency discharge plasma generation-based two-stage Hall-effect plasma accelerator, which comprises an annular acceleration channel having a gas inlet port, a high-frequency wave supply section, an anode, a cathode, a neutralizing electron generation portion and a magnetic-field generation element, wherein: gas introduced from the gas inlet port into the annular acceleration channel is ionized by a high-frequency wave supplied from the high-frequency wave supply section, to generate plasma; a positive ion includes in the generated plasma is accelerated by an acceleration voltage applied between the anode and cathode, and ejected outside; and an electron included in the generated plasma is restricted in its movement in the axial direction of the annular acceleration channel by an interaction with a magnetic field. The two-stage Hall-effect plasma accelerator is designed to control a degree of ion acceleration in accordance with the acceleration voltage serving as an acceleration control parameter, and control an amount of plasma generation in accordance with the high-frequency wave output serving as a plasma-generation control parameter. The two-stage Hall-effect plasma accelerator of the present invention can control the ion acceleration and the plasma generation in a highly independent manner.