The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 13, 2007

Filed:

Jun. 13, 2005
Applicant:

Tetsuro Asano, Gunma, JP;

Inventor:

Tetsuro Asano, Gunma, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/48 (2006.01); H01L 27/095 (2006.01);
U.S. Cl.
CPC ...
Abstract

A pad electrode of a field effect transistor is formed solely of a pad metal layer without providing a gate metal layer. A high concentration impurity region is provided below the pad electrode, and the pad electrode is directly contacted to a substrate. Predetermined isolation is ensured by the high concentration impurity region. Accordingly, in a structure not requiring a nitride film as similar to the related art, it is possible to avoid defects upon wire boding attributing to hardening of the gate metal layer. Therefore, in the case of a buried gate electrode structure for enhancing characteristics of the field effect transistor, it is possible to enhance reliability and yields.


Find Patent Forward Citations

Loading…