The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2007
Filed:
Apr. 16, 2002
Daizo Jito, Kobe, JP;
Hisaki Tarui, Kobe, JP;
Daizo Jito, Kobe, JP;
Hisaki Tarui, Kobe, JP;
Sanyo Electric Co., Ltd., Osaka, JP;
Abstract
A method of manufacturing an electrode for a secondary cell capable of readily forming an active material layer only on a necessary portion of a collector by a method supplying raw material from a gas phase is obtained. This method of manufacturing an electrode for a secondary cell comprises steps of forming a mask layer containing a material reduced in adhesion to a collector due to a high temperature for forming an active material layer on a prescribed region of the collector, forming the active material layer on the collector and on the mask layer by a method supplying raw material from a gas phase and removing the mask layer and part of the active material layer formed on the mask layer. Thus, the mask layer is readily separated from the collector after the active material layer is formed by the method supplying raw material from a gas phase. Consequently, the mask layer and part of the active material layer formed on the mask layer are so readily removed that the active material layer is readily located only on a necessary portion of the collector.