The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2007
Filed:
Jul. 08, 2004
Applicants:
Cherng-chyi Han, San Jose, CA (US);
Laurie Lauchlan, Saratoga, CA (US);
Xiaomin Liu, Milpitas, CA (US);
Inventors:
Cherng-Chyi Han, San Jose, CA (US);
Laurie Lauchlan, Saratoga, CA (US);
Xiaomin Liu, Milpitas, CA (US);
Assignee:
Headway Technologies, Inc., Milpitas, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/127 (2006.01); B44C 1/22 (2006.01);
U.S. Cl.
CPC ...
Abstract
A process for achieving tighter reader and writer track width control is disclosed. The write gap layer is used as the plating seed on which the upper pole is electro-formed. This allows the write gap layer to then be deposited through a precisely controllable process such as sputtering. Since less material needs to be removed during pole trimming, a thinner layer of photoresist may be used, resulting in improved dimensional control.