The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 2007

Filed:

Aug. 01, 2005
Applicants:

Stefano Parascandola, Dresden, DE;

Dirk Caspary, Dresden, DE;

Inventors:

Stefano Parascandola, Dresden, DE;

Dirk Caspary, Dresden, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/70 (2006.01);
U.S. Cl.
CPC ...
Abstract

Spacers are formed on sidewalls of striplike parts of a pattern layer of periodic structure. The pattern layer is removed, and the spacers are covered with a further spacer layer, which is then structured to second sidewall spacers. Gaps between the spacers are filled with a complementary layer. The upper surface is planarized to a lower surface level, leaving a periodic succession of the first spacers, the second spacers and the residual parts of the complementary layer. The lateral dimensions are adapted in such a manner that a removal of one or two of the remaining layers renders a periodic pattern of smaller pitch.


Find Patent Forward Citations

Parascandola, Stefano. (2007). Method of production pitch fractionizations in semiconductor technology (U.S. Patent No. 7291560). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7291560

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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