The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2007
Filed:
Dec. 26, 2002
Atsushi Hiraizumi, Tokyo, JP;
Koji Masuda, Tokyo, JP;
Hiroyuki Abe, Tokyo, JP;
Tetsuro Wada, Tokyo, JP;
Koichi Shintomi, Tokyo, JP;
Kazuyou Mizuno, Tokyo, JP;
Atsushi Hiraizumi, Tokyo, JP;
Koji Masuda, Tokyo, JP;
Hiroyuki Abe, Tokyo, JP;
Tetsuro Wada, Tokyo, JP;
Koichi Shintomi, Tokyo, JP;
Kazuyou Mizuno, Tokyo, JP;
Abstract
A thin film deposition method for producing an optical film with an optical characteristic on a deposition substrate in a vacuum chamber is provided. The method may include preparing in the vacuum chamber a deposition source which is a source of the film producing material; holding the deposition substrate with a substrate holding member; arranging the deposition substrate and the deposition source such that, given that a vertical distance from the center of the deposition substrate to the deposition source is defined as ZK and a horizontal distance between the deposition substrate and the deposition source as Xk, Xk/Zk is set to satisfy a following equation 0.48≦Xk/Zk≦0.78; rotating the deposition substrate on a rotational axis which is orthogonal to the deposition substrate; and evaporating the film producing material of the deposition source to perform deposition on the deposition substrate.