The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2007
Filed:
Dec. 20, 2001
George Paskalov, Torrance, CA (US);
Mark Gorodkin, Los Angeles, CA (US);
Viktor Sokolov, Sherman Oaks, CA (US);
George Paskalov, Torrance, CA (US);
Mark Gorodkin, Los Angeles, CA (US);
Viktor Sokolov, Sherman Oaks, CA (US);
Hydro Enterprises, Inc., Van Nuys, CA (US);
Abstract
An apparatus subjects water to waves from an RF plasma. This allows continuous production of 'activated water' characterized by cluster sizes below about 4 molecules per cluster, water having pH below 4 or above 10, or water having ORP of less than −350 mV or more than +800 mV. The basic frequency of the plasma is preferably between 0.44 MHz and 40.68 MHz, and the plasma is preferably modulated at a frequency between 10 kHz and 34 kHz. Flow rates typically range from 20 l/hr to about 2000 l/hr. Activated water can be used for many purposes, including antimicrobial cleaning of worktable, floor, wall, knife, transport and other surfaces, for example, in meat processing facilities and hospitals.