The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2007
Filed:
Mar. 05, 2002
Applicants:
Stephen Richard Duncan, Ashendon, GB;
Patrick Grant, Oxford, GB;
Paul Jones, Jericho, GB;
Timothy Rayment, Headington, GB;
Inventors:
Stephen Richard Duncan, Ashendon, GB;
Patrick Grant, Oxford, GB;
Paul Jones, Jericho, GB;
Timothy Rayment, Headington, GB;
Assignee:
Isis Innovation Limited, Oxford, GB;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B22D 11/00 (2006.01); B05B 7/06 (2006.01);
U.S. Cl.
CPC ...
Abstract
Material is incrementally deposited using material directed toward a deposition zone. The scan path of the directed material is controlled according to a path plan derived to reduce derivation from an ideal uniform temperature profile for the deposition during the deposition process. A path plan having angled scan passes that intersect (or overcross one another), for example in a mirrorbox path plan, is preferred.