The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 30, 2007

Filed:

Nov. 14, 2003
Applicants:

Reinhold Altpeter, Erlangen, DE;

Georg Hoever, München, DE;

Ingo Weber, Oviedo, FL (US);

Inventors:

Reinhold Altpeter, Erlangen, DE;

Georg Hoever, München, DE;

Ingo Weber, Oviedo, FL (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

The inventive system is used to design a technical system, which is characterized by condition variables and by diagnostic variables. A measurement field comprising first measured variables is incorporated into the design of the technical system, said first measured variables being measured with a predetermined accuracy. In addition, second measured variables can be measured with a predetermined accuracy. According to the inventive method, sensitivity variables are determined for the first measured variables. To determine said sensitivity variables, the extent to which a modification of the measurement accuracy of the first measured variables influences at least one parameter is calculated and to determine the second sensitivity variables, the extent to which the measurement of the second measured variables influences at least one parameter is calculated. The measurement field is then modified in such a way that the accuracy of the measured variables is altered, the first measured variables are removed from the measurement field and/or the second measured variables are added to the measurement field.


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