The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 30, 2007

Filed:

Jun. 26, 2006
Applicants:

William L. Kath, Evanston, IL (US);

Gino Biondini, Columbus, OH (US);

Sarah L. Fogal, Nashua, NH (US);

Inventors:

William L. Kath, Evanston, IL (US);

Gino Biondini, Columbus, OH (US);

Sarah L. Fogal, Nashua, NH (US);

Assignee:

Northwestern University, Evanston, IL (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 6/00 (2006.01); G02B 6/17 (2006.01); H04J 14/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and a system to produce, either in numerical simulations or in experiments, specified amounts of first, second and higher order PMD in a controlled manner, in particular large amounts. Parameters can be adjusted to obtain specific ranges of first, second and higher order PMD, and importance sampling can be used to determine the probability that the resulting PMD events can be obtained in realistic situations. Individual results obtained using specific parameter values can be combined to produce even larger ranges of PMD.


Find Patent Forward Citations

Loading…