The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2007
Filed:
Nov. 04, 2004
Toru Mikami, Kanagawa, JP;
Toru Koike, Tokyo, JP;
Toru Mikami, Kanagawa, JP;
Toru Koike, Tokyo, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A dimension measurement method includes irradiating a measurement mark on a sample on which a pattern to be measured is formed with light from a measurement direction, detecting reflected diffracted light from the measurement mark to measure intensity thereof, and calculating a shape parameter of the pattern on the basis of the measured intensity, the measurement mark having measurement patterns which have the same shape as at least part of the pattern and are arranged in rows and columns, the columns being composed of the measurement patterns disposed with a predeter period in the direction perpendicular to the measurement direction, wherein a relation between a wavelength of the light and the period is adjusted so that the measurement mark generates the reflected diffracted light substantially the same as reflected diffracted light which would be generated when the column is assumed to be a continuous line pattern.