The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2007
Filed:
Dec. 01, 2004
Ramkumar Subramanian, Sunnyvale, CA (US);
Bhanwar Singh, Morgan Hill, CA (US);
Khoi A. Phan, San Jose, CA (US);
Ramkumar Subramanian, Sunnyvale, CA (US);
Bhanwar Singh, Morgan Hill, CA (US);
Khoi A. Phan, San Jose, CA (US);
Advanced Micro Devices, Inc., Austin, TX (US);
Abstract
Disclosed are systems and methods that employ a structural framework of cell gratings placed on a wafer surface during an immersion lithography process to restrict motion of the immersion fluid. Thus, when the stepper lens comes in contact with the immersion fluid, a typically stable immersion fluid dynamics can be maintained with the cells during the immersion lithography process. In addition, various monitoring and control systems are employed to regulate stability of the immersion fluid.