The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2007
Filed:
Nov. 23, 2004
Dong-hun Lee, Anyang-si, KR;
Jong-hyon Ahn, Suwon-si, KR;
Do-yul Yoo, Sungnam-si, KR;
Sung-gun Kang, Suwon-si, KR;
Dong-Hun Lee, Anyang-si, KR;
Jong-Hyon Ahn, Suwon-si, KR;
Do-Yul Yoo, Sungnam-si, KR;
Sung-Gun Kang, Suwon-si, KR;
Abstract
An overlay mark includes at least one hole array formed on a semiconductor substrate and at least one linear trench adjacent to the hole array. The hole array may be formed adjacent to the linear trench along a predetermined direction. When alignment errors among patterns formed at predetermined portion of the semiconductor substrate are detected, the overlay mark may provide a contrast of light with a desired width and a high level so that alignment errors of patterns formed on the semiconductor substrate may be accurately detected and corrected using the overlay mark.