The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2007
Filed:
Oct. 15, 2002
Adam L. Cohen, Los Angeles, CA (US);
Gang Zhang, Monterey Park, CA (US);
Qui T. Le, Anaheim, CA (US);
Michael S. Lockard, Lake Elizabeth, CA (US);
Dennis R. Smalley, Newhall, CA (US);
Adam L. Cohen, Los Angeles, CA (US);
Gang Zhang, Monterey Park, CA (US);
Qui T. Le, Anaheim, CA (US);
Michael S. Lockard, Lake Elizabeth, CA (US);
Dennis R. Smalley, Newhall, CA (US);
Microfabrica, Inc., Van Nuys, CA (US);
Abstract
Various embodiments of the invention provide techniques for forming structures (e.g. HARMS-type structures) via an electrochemical extrusion process. Preferred embodiments perform the extrusion processes via depositions through anodeless conformable contact masks that are initially pressed against substrates that are then progressively pulled away or separated as the depositions thicken. A pattern of deposition may vary over the course of deposition by including more complex relative motion between the mask and the substrate elements. Such complex motion may include rotational components or translational motions having components that are not parallel to an axis of separation. More complex structures may be formed by combining the electrochemical extrusion process with the selective deposition, blanket deposition, planarization, etching, and multi-layer operations of a multi-layer electrochemical fabrication process.