The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 23, 2007

Filed:

May. 13, 2005
Applicants:

Yanming Liu, Clarence Center, NY (US);

Barry Muffoletto, Alden, NY (US);

David Goad, Orchard Park, NY (US);

Inventors:

Yanming Liu, Clarence Center, NY (US);

Barry Muffoletto, Alden, NY (US);

David Goad, Orchard Park, NY (US);

Assignee:

Greatbatch Ltd., Clarence, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01G 9/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

An oxygen plasma process for treating a dielectric oxide layer, particularly an anodic oxide, subsequent to its incorporation into an electrolytic capacitor is described. The present treatment reduces DC leakage and improves shelf life stability of the resulting capacitor in comparison to anodic oxides treated in a conventional manner. This is important for critical applications such as implantable cardioverter defibrillators where capacitor charging time and charge/discharge energy efficiency are critical.


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