The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7285375 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 23, 2007

Filed:

May. 31, 2004
Applicants:

Toshiyuki Matsumura, Fujino-machi, JP;

Norio Miura, Sagamihara, JP;

Inventors:

Toshiyuki Matsumura, Fujino-machi, JP;

Norio Miura, Sagamihara, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/029 (2006.01); G03F 7/031 (2006.01); G03F 7/033 (2006.01); G03F 7/028 (2006.01); G03F 7/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed is a light sensitive composition containing a compound A having a group capable of undergoing radical polymerization, a compound B having a group capable of undergoing cationic polymerization, a photopolymerization initiator C, and a polymer binder D, the light sensitive composition being characterized in that the photopolymerization initiator C comprises an iron-arene complex and a halogenated alkyl group-containing compound.


Find Patent Forward Citations

Matsumura, Toshiyuki. (2007). Photosensitive composition, photosensitive lithography plate and method for producing lithography plate (U.S. Patent No. 7285375). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7285375

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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