The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2007
Filed:
Oct. 08, 2004
Applicant:
Dayong Chen, Cary, NC (US);
Inventor:
Dayong Chen, Cary, NC (US);
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H03M 13/03 (2006.01);
U.S. Cl.
CPC ...
Abstract
Differential puncture patterns are used for puncturing and de-puncturing codewords transmitted over a communication channel. The puncture pattern comprises a series of successive differential indices or offsets corresponding to differences between successive bit indices in an absolute bit index sequence. The differential puncture patterns are used at the transmitter to select bits of a codeword for transmission over the communication channel. At the receiver, the differential puncture pattern is used to determine the bit positions of received bits in a de-punctured codeword.