The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 16, 2007

Filed:

May. 19, 2006
Applicants:

Thomas J. Brunschwiler, Thalwil, CH;

Urs Kloter, Dietikon, CH;

Ryan Joesph Linderman, Zurich, CH;

Bruno Michel, Adliswil, CH;

Hugo E. Rothuizen, Adliswil, CH;

Inventors:

Thomas J. Brunschwiler, Thalwil, CH;

Urs Kloter, Dietikon, CH;

Ryan Joesph Linderman, Zurich, CH;

Bruno Michel, Adliswil, CH;

Hugo E. Rothuizen, Adliswil, CH;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/10 (2006.01); H01L 21/00 (2006.01); F28D 17/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

An interface is formed by pressing a patterned first surface and a second surface together, with a particle-loaded interface material in between. The first surface is fabricated with a pattern of channels designed to redistribute the velocity gradients that occur in the interface material during interface formation in order to control the arrangement, orientation and concentration of particles at the end of the interface formation. The concept finds application in thermal interfaces and controlled placement of nano and micro particles and biological molecules.


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