The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2007
Filed:
Dec. 10, 2004
Max Braun, Wedemark, DE;
Kerstin Eichholz, Langenhagen, DE;
Stefan Palsherm, Barsinghausen, DE;
Carsten Brosch, Hannover, DE;
Max Braun, Wedemark, DE;
Kerstin Eichholz, Langenhagen, DE;
Stefan Palsherm, Barsinghausen, DE;
Carsten Brosch, Hannover, DE;
Solvay Fluor GmbH, Hannover, DE;
Abstract
A method of producing alkanes containing chlorine by addition of chlorine to C—C double bonds or C—C triple bonds or by exchange of hydrogen for chlorine by contacting the starting compound in the gas or liquid phase with elemental chlorine and irradiating the reaction mixture with UV light having a wavelength of λ≧280 nm. In this way pentachloroethane can be produced from trichloroethylene, CFC-113 from HCFC-123 or HFC-133a, CFC-112a from HCFC-142b, or HCFC-123 from HCFC-133a. The method also is suitable for separating photochlorinatable impurities from HFC-365-mfc to obtain purified HFC-365-mfc. Advantages include high yields and excellent selectivity.