The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 09, 2007

Filed:

Sep. 10, 2004
Applicants:

Daisuke Koreeda, Saitama-ken, JP;

Koichi Maruyama, Tokyo, JP;

Shuichi Takeuchi, Saitama-ken, JP;

Naohito Sasaki, Tokyo, JP;

Inventors:

Daisuke Koreeda, Saitama-ken, JP;

Koichi Maruyama, Tokyo, JP;

Shuichi Takeuchi, Saitama-ken, JP;

Naohito Sasaki, Tokyo, JP;

Assignee:

PENTAX Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 7/00 (2006.01); G02B 1/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

An objective lens on which a beam having parallel light fluxes is incident includes a single element lens and a reflection suppressing coating formed on at least one surface of the single element lens. The reflection suppressing coating is formed such that the reflectivity across a radius of the objective lens exhibits a local maximal value, and the reflection suppressing coating is formed to achieve the following condition:0.6<max<0.95,wherein hdenotes a distance between an optical axis and a position at which the reflectivity exhibits the local maximal value, and hmax denotes a distance between the optical axis and an outermost position of the effective diameter of the objective lens.


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