The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2007
Filed:
Jan. 30, 2004
Hideaki Takizawa, Kawasaki, JP;
Hideaki Takizawa, Kawasaki, JP;
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
The invention relates to a pattern forming method, a method of manufacturing a TFT substrate, a method of manufacturing a liquid crystal display and an exposure mask and provides a pattern forming method, a method of manufacturing a TFT substrate, a method of manufacturing a liquid crystal display and an exposure mask which make it possible to provide a liquid crystal display having high display characteristics. In a pattern forming method for forming a resist pattern extending across a first divided exposure region and a second divided exposure region among a plurality of divided exposure regions on a substrate, a resist film is formed on the substrate; the resist film in the first divided exposure region is exposed using an exposure mask to form a latent image which defines one edge of a resist pattern in the vicinity of a boundary between the first divided exposure region and the second divided exposure region; the resist film in the second divided exposure region is exposed using another exposure mask to form a latent image which defines another edge of the resist pattern in the vicinity of the boundary; and the resist film is developed to form the resist pattern.