The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 09, 2007

Filed:

Mar. 24, 2005
Applicants:

David Edwin Budinger, Loveland, OH (US);

Richard Ludwig Schmidt, Marblehead, MA (US);

Mark David Veliz, Mason, OH (US);

Michael Howard Rucker, Cincinnati, OH (US);

Inventors:

David Edwin Budinger, Loveland, OH (US);

Richard Ludwig Schmidt, Marblehead, MA (US);

Mark David Veliz, Mason, OH (US);

Michael Howard Rucker, Cincinnati, OH (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 15/02 (2006.01); B32B 5/16 (2006.01); B32B 7/02 (2006.01); B22F 1/00 (2006.01); B22F 9/00 (2006.01); B23K 35/22 (2006.01);
U.S. Cl.
CPC ...
Abstract

A nickel-base braze material suitable for closing holes in a high temperature component, such as a tip cap hole in a turbine blade. The braze material comprises first and second filler materials and a binder. The first filler material comprises particles of a first alloy, and the second filler material comprises particles of at least a second alloy having a lower melting temperature than the first alloy. The second alloy consists essentially of, by weight, about 8 to about 23 percent chromium, about 4 to about 18 percent cobalt, about 1.5 to about 6.0 percent tantalum, about 1.0 to about 6.0 percent aluminum, about 0.3 to about 1.5 percent boron, about 2.0 to about 6.0 percent silicon, up to 0.2 percent carbon, the balance being nickel and incidental impurities.


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