The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2007
Filed:
Dec. 12, 2003
Claude Beaulieu, Pierrefonds, CA;
Paul Lefebvre, Laval, CA;
Gilles L. Tourte, Montreal, CA;
André R. Vincelette, Rouyn-Noranda, CA;
Claude Beaulieu, Pierrefonds, CA;
Paul Lefebvre, Laval, CA;
Gilles L. Tourte, Montreal, CA;
André R. Vincelette, Rouyn-Noranda, CA;
Lxsix Photonics inc., St-Laurent, Quebec, CA;
Abstract
An apparatus for inducing a modification of the index of refraction of a substrate sensitive to electromagnetic radiation. The apparatus is capable of generating a first beam of electromagnetic radiation and a second beam of electromagnetic radiation that is different from the first beam. The first and the second beams converge toward a treatment area on the substrate, which is illuminated with electromagnetic radiation. The first beam and the second beam interact to create an interference pattern over a limited portion of the treatment area.