The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2007
Filed:
May. 11, 2005
Antoine P. Manens, Mountain View, CA (US);
Suresh Shrauti, San Mateo, CA (US);
Alain Duboust, Sunnyvale, CA (US);
Yan Wang, Sunnyvale, CA (US);
Liang-yuh Chen, Foster City, CA (US);
Antoine P. Manens, Mountain View, CA (US);
Suresh Shrauti, San Mateo, CA (US);
Alain Duboust, Sunnyvale, CA (US);
Yan Wang, Sunnyvale, CA (US);
Liang-Yuh Chen, Foster City, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A retaining ring for use with electrochemical mechanical processing is described. The retaining ring has a generally annular body formed with a conductive portion and a non-conductive portion. The non-conductive portion contacts the substrate during polishing. The conductive portion is electrically biased during polishing to reduce the edge effect that tends to occur with conventional electrochemical mechanical processing systems.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile