The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7276717 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 02, 2007

Filed:

Nov. 04, 2005
Applicants:

Osamu Kakuchi, Kasama, JP;

Yoshiyuki Kuramoto, Utsunomiya, JP;

Inventors:

Osamu Kakuchi, Kasama, JP;

Yoshiyuki Kuramoto, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G01B 11/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A measuring apparatus for measuring optical performance of a target optical system to be measured includes an optical unit for splitting light from a light source into measuring light and reference light so that the measuring light can be introduced into the target optical system, a reflection unit for reflecting the measuring light from the target optical system toward the target optical system via a fluid, and a detector for detecting an interference fringe generated between interference between the measuring light that has emitted from the target optical system after being reflected by the reflection unit and the reference light that does not pass the target optical system.


Find Patent Forward Citations

Kakuchi, Osamu. (2007). Measuring apparatus, exposure apparatus and device manufacturing method (U.S. Patent No. 7276717). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7276717

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…