The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2007
Filed:
Sep. 30, 2003
Alan P. Giorgi, Cupertino, CA (US);
Paul M. Green, Hollister, CA (US);
Garth W. Helf, San Jose, CA (US);
Eric C. O'brien, Milpitas, CA (US);
Qin Pan, Cupertino, CA (US);
Anthony L. Smith, San Jose, CA (US);
Robert J. Waltman, Gilroy, CA (US);
Alan P. Giorgi, Cupertino, CA (US);
Paul M. Green, Hollister, CA (US);
Garth W. Helf, San Jose, CA (US);
Eric C. O'Brien, Milpitas, CA (US);
Qin Pan, Cupertino, CA (US);
Anthony L. Smith, San Jose, CA (US);
Robert J. Waltman, Gilroy, CA (US);
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Abstract
A method is presented for controlling process delay times between a) thin film deposition and lubricant application, and b) lubricant application and abrasive polishing. Applicants have discovered that for certain lubricants, a minimum delay time after the overcoat has been deposited before the lubricant is applied increases the number of disks passing the glide test after abrasive polishing. In addition, applicants have discovered that for certain lubricants, the abrasive polishing should take place within a maximum time window following the application of the lubricant. A computerized work-in-progress tracking system is preferably used to implement the method of the invention.