The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 02, 2007

Filed:

Jul. 29, 2003
Applicants:

Norihiko Nadanami, Aichi, JP;

Norobu Ishida, Gifu, JP;

Takafumi Oshima, Aichi, JP;

Ryuji Inoue, Gifu, JP;

Tomonori Kondo, Aichi, JP;

Inventors:

Norihiko Nadanami, Aichi, JP;

Norobu Ishida, Gifu, JP;

Takafumi Oshima, Aichi, JP;

Ryuji Inoue, Gifu, JP;

Tomonori Kondo, Aichi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 27/407 (2006.01);
U.S. Cl.
CPC ...
Abstract

A hydrogen gas sensor capable of accurately measuring hydrogen concentration of a measurement gas atmosphere in the presence of a variety of interfering gasses such as HO and CO. In the hydrogen gas sensor, the flow sectional area of a diffusion-rate limiting portionis rendered small; the electrode surfaces of first and second electrodesandare rendered large; and/or a solution containing a polymer electrolyte which may be identical to that of a proton-conductive layeris applied onto the surfaces of the first and second electrodesandto thereby form a layer containing the polymer electrolyte. Thus, the rate of conduction of protons from the first electrodeto the second electrodebecomes greater than the rate at which protons are derived from hydrogen which is introduced onto the first electrodevia the diffusion-rate limiting portion


Find Patent Forward Citations

Loading…