The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2007
Filed:
Mar. 10, 2006
Kazuhito Mawatari, Aichi, JP;
Kazuhito Mawatari, Aichi, JP;
Meinan Machinery Works, Inc., Obu-shi, JP;
Abstract
A method for locating an optimum peeling axis of a log and a maximum radius point on peripheral surface of the log with respect to the located optimum peeling axis and an apparatus for practicing the method are disclosed. A plurality of swingable members are provided, each member having a contact surface which is swingable in contact with the peripheral surface of the log thereby to follows the peripheral profile of the log while it is being rotated about its preliminary axis. Angular positions of the contact surfaces are measured with respect to a reference position at a number of angularly spaced positions of the log. On the basis of the measured angular positions of the contact surfaces, radial distances of the log from a plurality of predetermined locations on the optimum peeling axis to selected contact surfaces are computed for comparison such radial distances. The distance having the greatest value is regarded as the maximum radius point of the log.