The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 02, 2007

Filed:

May. 21, 2004
Applicants:

Terry L. Taft, Big Flats, NY (US);

Gary W. Wise, Painted Post, NY (US);

Inventors:

Terry L. Taft, Big Flats, NY (US);

Gary W. Wise, Painted Post, NY (US);

Assignee:

Corning Incorporated, Corning, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03B 23/00 (2006.01); C03B 9/34 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed are high temperature free-flow mold for the production of near net-shape silica articles and method for the production of near net-shape silica articles. The mold is preferably made of graphite, preferably coated with SiC on the surfaces of the mold cavity. The mold and the process use no or less refractory elastic materials than that disclosed in the prior art, and does not alter or contaminate the glass composition. The mold the process are particularly suitable for the production of high purity silica articles for use in VUV and EUV lithographic devices.


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