The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 25, 2007

Filed:

Mar. 19, 2003
Applicants:

Akira Saitou, Tokyo, JP;

Toshimasa Yamazaki, Tokyo, JP;

Koichi Watanabe, Tokyo, JP;

Inventors:

Akira Saitou, Tokyo, JP;

Toshimasa Yamazaki, Tokyo, JP;

Koichi Watanabe, Tokyo, JP;

Assignee:

YKC Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H03H 7/42 (2006.01); H01P 3/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A balun in which the phase shift may be reduced significantly is disclosed. The balun has three lines, i.e. a first line b, a second line a and a third line c, arranged in parallel with the ground surface. The second line a and the third line c are arranged at the same height from the ground surface GC, the longitudinal length of each respective one of the first line b, second line a and third line c are specified to be equal to a quarter (¼) of the wavelength at the central frequency in the working band, and the capacitance Ca between the second line a and the ground surface GC is specified to be equal to the capacitance Cab between the second line a and the first line b. Furthermore, the distance hbetween the center of each respective one of the second line a and third line c in the height direction and the ground surface GC located closer to each respective one of the second line a and third line c is specified to be longer than the distance hbetween the center of the first line b in the height direction and the center of each respective one of the second line a and third line c in the height direction, or the permittivity of a dielectric Dis specified to be less than that of a dielectric D


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