The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 25, 2007

Filed:

Sep. 25, 2002
Applicants:

Jin-shan Wang, Pittsford, NY (US);

Xiaoru Wang, Webster, NY (US);

Samuel Chen, Penfield, NY (US);

Thomas N. Blanton, Rochester, NY (US);

Inventors:

Jin-Shan Wang, Pittsford, NY (US);

Xiaoru Wang, Webster, NY (US);

Samuel Chen, Penfield, NY (US);

Thomas N. Blanton, Rochester, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J 3/12 (2006.01); C08K 9/04 (2006.01); C08K 3/34 (2006.01); C04B 33/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates to a splayed material comprising a layered material splayed with a particle having a diameter equal to or less than 3 micrometers. Another embodiment of the invention includes an article comprising a matrix and a layered material splayed with a polymeric particles dispersed in a medium. The invention also relates to methods for preparing these materials via mixing, milling and emulsifying a solvent borne polymer with a surfactant. A further method describes a method for preparing a nanocomposite from a splayant particle prepared by combining an emulsion polymerization monomer and a surfactant dispersible in a medium wherein the monomer is not dispersible in the medium.


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