The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2007
Filed:
Jun. 24, 2003
David J. Nelson, Rochester, NY (US);
Sridhar Sadasivan, Rochester, NY (US);
Ramesh Jagannathan, Rochester, NY (US);
Seshadri Jagannathan, Pittsford, NY (US);
Glen C. Irvin, Jr., Rochester, NY (US);
Rajesh V. Mehta, Rochester, NY (US);
David J. Nelson, Rochester, NY (US);
Sridhar Sadasivan, Rochester, NY (US);
Ramesh Jagannathan, Rochester, NY (US);
Seshadri Jagannathan, Pittsford, NY (US);
Glen C. Irvin, Jr., Rochester, NY (US);
Rajesh V. Mehta, Rochester, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
An article having multiple spectral deposits is provided. The article can include a support and a single nanomorphic marking material adapted to reflect light having a first spectral content and adapted to reflect light having a second spectral content. The article can include a support and a nanomorphic marking material held by the support that luminesces at a plurality of wavelengths. The article can include a support and marking material having a first particle size and a second particle size. The first particle size reflects a first spectrum and the second particle size reflects a second spectrum. The article can include a support and a marking material held by said support with the marking material including a nanocrystalline particulate having a measurable property non-characteristic of the same marking material in a bulk state.