The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2007
Filed:
Jan. 15, 2004
Vipin Gopal, Manchester, CT (US);
Jan Jelinek, Plymouth, MN (US);
Alan Haggerty, Hamel, MN (US);
Honeywell International Inc., Morristown, NJ (US);
Abstract
Integrated modeling and symbolic manipulation is leveraged for the derivation, construction, maintenance, and reuse of application-independent models. Related models created for different applications share a common ancestry and maintain model consistency while enabling the models to share information about the process. Environment independent proper ancestor models (PAMs) are created for generic components of a process, such as a distillation or flash column. Models underlying an application may be comprised of various representations of multiple such processes corresponding to many different physical components. PAMs contain symbolic representations of different sub processes that occur within a process or component. A user makes assumptions about the component, by indicating how sub processes are to be considered or not considered. PAMs are then modified in accordance with the assumptions to derive a specific environment model (SEM).