The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 18, 2007

Filed:

Sep. 03, 2004
Applicants:

Tatsuo Akiyama, Tokyo, JP;

Masahiro Abe, Kanagawa, JP;

Kenji Hirakawa, Tokyo, JP;

Shigeru Komatsu, Kanagawa, JP;

Inventors:

Tatsuo Akiyama, Tokyo, JP;

Masahiro Abe, Kanagawa, JP;

Kenji Hirakawa, Tokyo, JP;

Shigeru Komatsu, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2006.01); G06F 17/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for designing a manufacturing process of an electronic device includes calibrating a technology computer-aided design system by fitting simulation parameters of manufacturing process and electrical characteristic simulations, using first feature of commercial manufacturing process of first electronic device manufactured by first manufacturing facilities, and first electrical characteristic of the first electronic device; acquiring second feature of trial manufacturing process of second electronic device manufactured by second manufacturing facilities, and second electrical characteristic of the second electronic device; calculating simulation electrical characteristic of the second electronic device by substituting the second feature to the manufacturing process simulation corresponding to the trial manufacturing process; comparing the second electrical characteristic with the simulation electrical characteristic; and creating design specification of commercial manufacturing process of the second manufacturing facilities based on difference between the second electrical characteristic and the simulation electrical characteristic.


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