The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2007
Filed:
Jul. 08, 2004
Method for the quantitative measurement of the pulse laser stability of synthetic fused silica glass
Christian Muehlig, Jena, DE;
Wolfgang Triebel, Jena-Cospeda, DE;
Siegfried Kufert, Kahla, DE;
Sylvia Bark-zollmann, Jena, DE;
Ute Natura, Jena, DE;
Frank Coriand, Jena, DE;
Christian Muehlig, Jena, DE;
Wolfgang Triebel, Jena-Cospeda, DE;
Siegfried Kufert, Kahla, DE;
Sylvia Bark-Zollmann, Jena, DE;
Ute Natura, Jena, DE;
Frank Coriand, Jena, DE;
Schott Glas, Mainz, DE;
Abstract
The present invention refers to a method for the quantitative measurement of the pulse laser stability of synthetic fused silica, whereby this method avoids time-consuming and demanding measurements and saves material. First, the absorption of fused silica is measured for different energy densities, and a non-linear function α(H) is determined on the basis of the measured values. Second, the fused silica is subject to radiation with a higher energy density up to the point at which a constant absorption value is achieved. In the following, the absorption of the fused silica is measured at different energy densities, and a non-linear function α(H) is determined. The difference between the two non-linear functions indicates the increase of absorption that depends on the energy density.