The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2007
Filed:
Apr. 11, 2005
Shunpu LI, Cambridge, GB;
Christopher Newsome, Cambridge, GB;
Thomas Kugler, Cambridge, GB;
David Russell, Cambridge, GB;
Shunpu Li, Cambridge, GB;
Christopher Newsome, Cambridge, GB;
Thomas Kugler, Cambridge, GB;
David Russell, Cambridge, GB;
Seiko Epson Corporation, Tokyo, JP;
Abstract
Provided is a method forming a desired pattern of electronically functional materialon a substrate. The method comprises the steps of: creating a first layer of patterning materialon the substrate whilst leaving areas of the substrate exposed to define said desired pattern; printing a suspension comprising particles of the electronically functional materialin a liquid dispersant, to which the patterning material is impervious, on the patterning material and the exposed substrate; removing at least some of the liquid dispersant from the suspension to consolidate the particles; and applying a first solvent to said consolidated particles which is capable of solubilizing the patterning materialand to which the consolidated particles are pervious so that the patterning material is removed from the substratetogether with any overlying electronically functional material