The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2007
Filed:
Jan. 22, 2003
Takashi Yamaoka, Ibaraki, JP;
Shuuji Yano, Ibaraki, JP;
Junichi Adachi, Ibaraki, JP;
Masayuki Kawai, Ibaraki, JP;
Kanako Wasai, Ibaraki, JP;
Nao Murakami, Ibaraki, JP;
Takashi Yamaoka, Ibaraki, JP;
Shuuji Yano, Ibaraki, JP;
Junichi Adachi, Ibaraki, JP;
Masayuki Kawai, Ibaraki, JP;
Kanako Wasai, Ibaraki, JP;
Nao Murakami, Ibaraki, JP;
Nitto Denko Corporation, Ibaraki-shi, Osaka, JP;
Abstract
A method for preparing an optical film, which comprises applying and developing an application liquid mixture containing a liquid crystal monomer, a chiral agent and a polymerization initiator on an orientation substrate, subjecting the resultant developed layer to a heat treatment, to orient the monomer to a cholesteric structure, and then subjecting the developed layer to a poltmerization treatment, to polymerize the oriented liquid crystal monomer, thereby forming an optical film exhibiting a selective reflection wave length of 100 to 320 nm. An optical film prepared by the above method is reduced in the coloring due to selective reflection.