The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2007
Filed:
Sep. 20, 2004
Michael J. Renn, Hudson, WI (US);
Michael J. Renn, Hudson, WI (US);
Optomec Design Company, Albuquerque, NM (US);
Abstract
Methods and apparatus for the deposition of a source material () are disclosed. An atomizer () renders a supply of source material () into many discrete particles. A force applicator () propels the particles in continuous, parallel streams of discrete particles. A collimator () controls the direction of flight of the particles in the stream prior to their deposition on a substrate (). In an alternative embodiment of the invention, the viscosity of the particles may be controlled to enable complex depositions of non-conformal or three-dimensional surfaces. The invention also includes a wide variety of substrate treatments which may occur before, during or after deposition. In yet another embodiment of the invention, a virtual or cascade impactor may be employed to remove selected particles from the deposition stream.